激光器
材料科学
硅
辐照
干洗
光电子学
航程(航空)
光学
复合材料
废物管理
物理
工程类
核物理学
作者
Werner Zapka,W. Ziemlich,W. P. Leung,A. C. Tam
出处
期刊:Advanced Materials for Optics and Electronics
[Wiley]
日期:1993-02-01
卷期号:2 (1-2): 63-70
被引量:14
标识
DOI:10.1002/amo.860020108
摘要
Abstract Pulsed‐laser‐induced removal of particles from surfaces is a new cleaning technique. This laser cleaning can be performed on dry surfaces as well as on wet surfaces with a micron‐thick liquid film during pulsed laser irradiation to provide enhanced removal efficiency. Using the latter technique, to be called ‘steam laser cleaning’ here, we are able to remove epoxy, alumina, silicon or gold particles with diameters in the range 0.1–10 μm from silicon and other surfaces.
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