Interfacial Interactions in van der Waals Heterostructures of MoS2 and Graphene

石墨烯 材料科学 堆积 异质结 范德瓦尔斯力 凝聚态物理 纳米技术 光电子学 化学 物理 分子 核磁共振 有机化学
作者
Hai Li,Jiangbin Wu,Feirong Ran,Miao‐Ling Lin,Xue‐Lu Liu,Yanyuan Zhao,Xin Lu,Qihua Xiong,Jun Zhang,Wei Huang,Hua Zhang,Ping‐Heng Tan
出处
期刊:ACS Nano [American Chemical Society]
卷期号:11 (11): 11714-11723 被引量:99
标识
DOI:10.1021/acsnano.7b07015
摘要

Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunneling electron microscopy can directly image the atomically sharp interfaces in the vdWHs, the interfacial coupling and lattice dynamics of vdWHs formed by two different types of 2DMs, such as semimetal and semiconductor, are not clear so far. Here, we report the ultralow-frequency Raman spectroscopy investigation on interfacial couplings in the vdWHs formed by graphene and MoS2 flakes. Because of the significant interfacial layer-breathing couplings between MoS2 and graphene flakes, a series of layer-breathing modes with frequencies dependent on their layer numbers are observed in the vdWHs, which can be described by the linear chain model. It is found that the interfacial layer-breathing force constant between MoS2 and graphene, α0⊥(I) = 60 × 1018 N/m3, is comparable with the layer-breathing force constant of multilayer MoS2 and graphene. The results suggest that the interfacial layer-breathing couplings in the vdWHs formed by MoS2 and graphene flakes are not sensitive to their stacking order and twist angle between the two constituents. Our results demonstrate that the interfacial interlayer coupling in vdWHs formed by two-dimensional semimetals and semiconductors can lead to new lattice vibration modes, which not only can be used to measure the interfacial interactions in vdWHs but also is beneficial to fundamentally understand the properties of vdWHs for further engineering the vdWHs-based electronic and photonic devices.
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