材料科学
复合数
复合材料
聚酰亚胺
极限抗拉强度
热稳定性
电介质
多孔性
硅氧烷
抗弯强度
耐化学性
介电损耗
基质(化学分析)
介电常数
含水量
作者
X. L. Xu,Ming Zeng,Diao Li,Han Wu,Yupei Yang,Ya Peng
标识
DOI:10.1177/09540083251393498
摘要
In order to meet the needs of modern communication technology, polyimide films with low dielectric constant and excellent comprehensive properties need to be prepared. In this study, fluorinated polyimide (SiFPI) and ether-containing polyimide (SiBPI) were synthesized via siloxane modification. On this basis, amino-functionalized porous silica particles were used as reinforcing fillers. Porous polyimide composite films (SiFPI/SiO 2 and SiBPI/SiO 2 ) were prepared by incorporating silica particles into the polyimide matrix via in-situ polymerization. The effects of silica content on the dielectric, mechanical, thermal, and water resistance properties of the composite films were systematically investigated and discussed. The results showed that at the silica content of 6 wt%, the dielectric constant of the SiFPI/SiO 2 composite decreased from 2.90 to 2.33 at 1 MHz, while that of the SiBPI/SiO 2 composite decreased from 2.92 to 2.37. Both composite films also exhibited high mechanical performance, with the tensile strength of the SiFPI/SiO 2 and SiBPI/SiO 2 composites reaching 136.2 MPa and 111.3 MPa, respectively. With the silica content increasing, both composite films exhibited a notable reduction in water absorption, which remained below 0.95%. Moreover, the composite films maintained comparable thermal stability to that of the pure film.
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