高电子迁移率晶体管
拉普拉斯变换
指数函数
晶体管
指数衰减
高斯分布
电子俘获
时间常数
计算物理学
计算机科学
算法
电子工程
物理
数学
电子
数学分析
电气工程
量子力学
电压
工程类
作者
Nicola Modolo,Carlo De Santi,G. Baratella,Andrea Minetto,Luca Sayadi,Sébastien Sicre,G. Prechtl,Gaudenzio Meneghesso,Enrico Zanoni,Matteo Meneghini
标识
DOI:10.1109/ted.2023.3284806
摘要
Ideally, de-trapping transients in semiconductors originate from discrete energy levels, and the emission profile follows a pure exponential decay; however, it has been widely shown that this rarely happens in real devices, for which capture and emission processes have a strongly stretched exponential shape. Conventional methodologies for capture/emission time constants mapping (CET maps) are based on the double derivative (DD) or bivariate Gaussian (BG) approximation, which may lead to inaccuracies in the presence of complex defect distributions. In this article, we introduce a new methodology, based on the double inverse Laplace transform, to extract the accurate capture-emission time (CET) map of these defects. The proposed approach is compared with the conventional approximated solutions, thus giving insight into whether the error introduced by the simplified approaches can be considered negligible or not. First, to ensure full control of the input parameters, the analysis is carried out on custom-generated functions with different stretching parameters. Then, the developed methodology is used to extract, for the first time, the full capture/emission time map from a power GaN high-electron mobility transistor (HEMT) subjected to positive bias instability (PBI) test. The proposed approach is universal and can be adopted by a wide variety of electronic devices in the presence of charge-trapping processes.
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