阻抗控制
抛光
控制理论(社会学)
职位(财务)
电阻抗
接触力
平滑的
变量(数学)
灵活性(工程)
材料科学
常量(计算机编程)
跟踪(教育)
机械加工
过程(计算)
控制工程
机械阻抗
跟踪误差
插值(计算机图形学)
二次方程
控制器(灌溉)
计算机科学
机器人
机床
阻抗参数
机械工程
法向力
控制变量
机器人学
控制系统
最优控制
运动学
磁道(磁盘驱动器)
过程控制
弹道
二次规划
作者
Ling-Xiao Li,Bohan Lu,Man Jiang,Lifu Gao,Yuxiang Sun
标识
DOI:10.1016/j.jmapro.2025.08.034
摘要
Maintaining a constant normal contact force during the polishing process is essential for consistent material removal. However, achieving automated robotic polishing for workpieces without prior models necessitates considerable flexibility in both position and force control, which presents significant challenges. To address this issue, the force tracking error is examined, revealing that force fluctuations primarily result from the effects of posture adjustments on the end-effector position and workpiece perturbations. Accordingly, a robot attitude smoothing scheme based on contact moments and quaternion interpolation is proposed. Furthermore, the quadratic programming variable impedance control method (QPIC) is introduced, transforming the variable impedance design problem into a constrained optimization problem. This approach adaptively adjusts the impedance parameters to accommodate workpiece perturbations. Finally, experiments on robotic metal polishing demonstrate that this framework can effectively adapt to unknown-model workpieces profiles and achieve high-quality surfaces.
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