Nonvolatile behavior of resistive switching memory in Ag/WOx/TiOy/ITO device based on WOx/TiOy heterojunction

Two-terminal structure memristors are the most promising electronic devices that could play a significant role in artificial intelligence applications of the next generation and the post-Moore era. In this work, we fabricated the memristive device by depositing a heterojunction WOx/TiOy functional layer onto an indium tin oxide substrate using magnetron sputtering. The Ag/WOx/TiOy/ITO device exhibits improved memory behavior of bipolar resistive switching (RS) nonvolatile compared to TiOy-based single-layer memristors, enabling it to meet high-density information storage requirements. Moreover, our device exhibited the coexistence of the negative differential resistance effect and the behavior of the RS memory. Through a comprehensive analysis of conductivity on the curve of current–voltage (I–V), a physical model based on the mechanism of space charge-limited current, ohmic conduction, and Schottky emission was suggested to explain the behavior device RS memory. This study's findings demonstrate that including a heterojunction bilayer WOx/TiOy as a functional layer can significantly improve the performance of memristive devices. This advancement expands the potential application of ferroelectric metallic oxide heterojunctions within the field of memristors.