On chemical kinetics of silicon deposition from silane (II). Comparing 1st‐ and 0.5th‐reaction order

Abstract Theoretical expressions for silicon layer deposition from silane pyrolysis within an open isothermal reactor tube has been derived for 0.5 th order of chemical reaction with restricting the discussion to homogeneous gas reaction, and compared to the analogous expressions of chemical reaction characterized by 1 st order relationship. Both kinds of theoretical equations give results free from contradictions when applied to experimentally based data of silane consumption on the one hand and silicon deposition distribution on the other, at least, with respect to those data published by Puga. First order reaction is characterized by an activation energy of Δ E aSi = 34 – 39 kcal/mole, and 0.5 th order reaction by Δ E aSi = 23 – 26 kcal/mole. Chemical reaction of 0.5 th order is to be preferred rather than 1 st order.