M. Arafa,K. Ismail,J. O. Chu,B.S. Meyerson,I. Adesida
出处
期刊:IEEE Electron Device Letters [Institute of Electrical and Electronics Engineers] 日期:1996-12-01卷期号:17 (12): 586-588被引量:50
标识
DOI:10.1109/55.545779
摘要
A self-aligned process for the fabrication of SiGe p-type modulation-doped field-effect transistors (MODFETs) is described. Self-aligned devices with 0.1-μm gate-length have been fabricated and characterized. A maximum dc extrinsic transconductance of 258 mS/mm was obtained with a low turn-on resistance and very low knee voltage. Excellent high frequency performance with a unity current-gain cutoff frequency (fT) of 70 GHz was obtained. This excellent high frequency performance was exhibited even at drain bias as low as 0.5 V.