Environmentally Friendly Slurry of Using Ceo2/Mos2 Mixed Abrasives in Quartz Glass Chemical Mechanical Polishing

In the traditional quartz glass polishing slurry, cerium oxide (CeO2) is usually used as a main abrasive to provide the main contribution to the glass surface planarization. However, the irregular shape of abrasive usually produces some defects on the glass surface under certain polishing pressure. On this basis, a new type of polishing slurry for chemical mechanical polishing of quartz glass was developed by using potassium oleate (KOL), deionized water, cerium dioxide and molybdenum disulfide (MoS2). Due to the unique two-dimensional structure of MoS2, it acts as a solid lubricant in the system to reduce the defects caused by abrasive on the glass surface, so as to improve the surface quality. Through this design, the MRR of quartz glass during CMP is 151.76 nm/min and the surface roughness Ra of quartz glass after CMP is 0.783nm. Under the same polishing conditions, MRR and Ra are superior to the traditional CeO2 based polishing solution, respectively. Under the synergistic effect of CeO2 and MoS2, the abrasive performance of glass substrate is significantly improved, which provides a new idea for the development of polishing fluid by using the synergistic effect between abrasive and two-dimensional materials.