异质结
材料科学
光电子学
光学
分析化学(期刊)
物理
化学
色谱法
作者
S. W. Lee,Jeongmin Kim,Jeongmin Kim,Woong Choi,Jihyun Kim,Jihyun Kim
出处
期刊:ACS Photonics
[American Chemical Society]
日期:2025-03-24
卷期号:12 (4): 2112-2119
被引量:8
标识
DOI:10.1021/acsphotonics.4c02595
摘要
A WSe 2 /β-Ga 2 O 3 heterojunction (HJ)-based enhancement-mode (E-mode) phototransistor with self-powered operation was developed for ultraviolet-C (UV-C) photodetector applications, featuring a top-gate p-type WSe 2 (p-WSe 2 ) and an n-type ultrawide-bandgap β-Ga 2 O 3 that serves as both the conductive channel and UV-C absorption layer. To increase the hole concentration in WSe 2 dry-transferred onto β-Ga 2 O 3, the top few layers of WSe 2 were oxidized to tungsten oxide (WO x ) (2 < x < 3) with a high work-function value via UV–ozone treatment. High-resolution transmission electron microscopy and energy-dispersive X-ray spectroscopy revealed excellent interface quality with atomic-scale layer uniformity in the HJ of WO x /WSe 2 /β-Ga 2 O 3 . The WSe 2 /β-Ga 2 O 3 p–n HJ diode exhibited a high rectification ratio (∼10 9 ) and an extremely low reverse current (14 fA), allowing the demonstration of a normally off n-channel β-Ga 2 O 3 phototransistor integrated with an ultrathin p-WSe 2 stack. The type-II band alignment of this HJ promoted efficient separation of photogenerated electron–hole pairs under UV-C illumination, allowing us to achieve excellent optoelectronic performance under standalone operation. Without an external power source, the WSe 2 /β-Ga 2 O 3 E-mode phototransistor exhibited excellent optoelectronic performance, including responsivity of 2.1 A W –1, a photo-to-dark current ratio of 1.5 × 10 3, external quantum efficiency of 10.2%, specific detectivity of 6.4 × 10 7 Jones, UV-A selectivity with a rejection ratio ( R 254nm / R 365nm ) of 4, and a fast response without persistent photoconductivity. These findings highlight the potential of p-WSe 2 /β-Ga 2 O 3 heterostructure UV-C phototransistors with high sensitivity and energy efficiency because of their compact and standalone deep-UV optoelectronic architecture.
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