High‐temperature X‐ray Time‐lapse Imaging Based on the Improved Scintillating Performance of Na5Lu9F32:Tb3+ Glass Ceramics

Abstract Scintillating materials have advanced significantly with scientific and technological progress. However, developing scintillators capable of time‐lapse imaging under extreme conditions, such as high‐temperature environments, remains a formidable challenge. Herein, Tb 3+ ‐doped oxyfluoride glass ceramics (GCs) with exceptional scintillation performance and X‐ray‐induced persistent luminescence (PersL) are successfully fabricated. Remarkably, the luminescent intensities under ultraviolet and X‐ray excitation are significantly enhanced by optimizing the Al 2 O 3 content and inducing the precipitation of Na 5 Lu 9 F 32 nanocrystals. The integral X‐ray‐excited luminescence intensity reaches 219.3% of that of Bi 4 Ge 3 O 12 . The GCs exhibit robust irradiation resistance even under high‐power X‐ray exposure. Real‐time imaging based on GCs demonstrates a spatial resolution of 18 lp mm −1 . Furthermore, the GCs display pronounced thermally stimulated PersL following X‐ray excitation, attributed to the generation of Frenkel defects. This behavior facilitates the development of a time‐lapse imaging technique with high‐temperature visibility after X‐ray irradiation, achieving an impressive spatial resolution of 14 lp mm −1 , and allowing X‐ray image storage for over 168 h. These findings underscore the immense potential of GC scintillators for advanced X‐ray imaging applications, particularly in harsh environments.