原子层沉积
图层(电子)
材料科学
电极
沉积(地质)
氧化物
纳米技术
逐层
化学工程
光电子学
化学
冶金
地质学
工程类
物理化学
古生物学
沉积物
标识
DOI:10.1088/978-0-7503-4064-9ch5
摘要
In this chapter, recent progress in atomic layer deposition (ALD)-modification of nanostructured electrodes in SOCs is reviewed. The review starts with an introduction describing the need for nanostructured electrodes and why ALD can meet the need. The review then briefly presents the working principle and basic procedure of ALD process. The applications of ALD in SOCs are then reviewed in porous oxygen electrodes, barrier layer, electrolyte, and fuel electrodes. Last, the limitations of ALD technique in SOCs are candidly discussed.
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