拓扑绝缘体
碲化铋
材料科学
缩进
纳米电子学
纳米压痕
断裂韧性
热电效应
韧性
纳米机电系统
热电材料
纳米技术
复合材料
凝聚态物理
物理
热导率
热力学
纳米颗粒
纳米医学
作者
Caterina Lamuta,A. Cupolillo,Antonio Politano,Ziya S. Aliev,М. Б. Бабанлы,Е. В. Чулков,Leonardo Pagnotta
出处
期刊:Nano Research
[Springer Science+Business Media]
日期:2016-02-01
卷期号:9 (4): 1032-1042
被引量:32
标识
DOI:10.1007/s12274-016-0995-z
摘要
Bismuth telluride (BiTe) is one of the most important commercial thermoelectric materials. In recent years, the discovery of topologically protected surface states in Bi chalcogenides has paved the way for their application in nanoelectronics. Determination of the fracture toughness plays a crucial role for the potential application of topological insulators in flexible electronics and nanoelectromechanical devices. Using depth-sensing nanoindentation tests, we investigated for the first time the fracture toughness of bulk single crystals of BiTetopological insulators, grown using the Bridgman-Stockbarger method. Our results highlight one of the possible pitfalls of the technology based on topological insulators.
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