俄歇电子能谱
光刻胶
电子光谱学
化学
材料科学
元素分析
二次离子质谱法
光谱学
质谱法
分析化学(期刊)
纳米技术
无机化学
物理
有机化学
核物理学
量子力学
色谱法
图层(电子)
作者
R. Olshove,Gerald A. Garwood,Ian Mowat,J. W. Bangs,M. V. Liguori
标识
DOI:10.1007/s11664-005-0031-7
摘要
Hg1−xCdxTe surface chemistry has been studied extensively with well-known tools such as electron spectroscopy for chemical analysis (ESCA) and Auger electron spectroscopy (AES) in order to advance detector array operability, performance, and yield. Raytheon Vision Systems has pioneered the first application of time-of-flight secondary ion mass spectrometry (TOF-SIMS) as a Hg1−xCdxTe surface diagnostic tool to provide unprecedented analysis capability, including analyzing a 0.5-µm-diameter spot, high mass resolution, elemental and molecular composition scrutiny, applicability to insulators, and surface film sensitivity in the part per million range. In this study, data are presented illustrating surface chemistry geometry effects and photoresist redeposition due to common Hg1−xCdxTe processing steps including photolithography, bromine etching, and photoresist stripping.
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