制作
微加工
材料科学
石墨烯
纳米技术
微尺度化学
微观结构
蚀刻(微加工)
基质(水族馆)
图层(电子)
复合材料
医学
替代医学
病理
海洋学
数学教育
数学
地质学
作者
Jiwoo Kim,Donghoon Moon,Hyunchul Kim,Arend M. van der Zande,Gwan Hyoung Lee
出处
期刊:ACS Nano
[American Chemical Society]
日期:2024-04-30
标识
DOI:10.1021/acsnano.4c01279
摘要
Three-dimensional (3D) microfabrication techniques play a crucial role across various research fields. These techniques enable the creation of functional 3D structures on the microscale, unlocking possibilities for diverse applications. However, conventional fabrication methods have limits in producing complex 3D structures, which require numerous fabrication steps that increase the costs. Graphene is an atomically thin material known for its deformability and impermeability to small gases and molecules, including reactive gases like XeF2. These features make graphene a potential candidate as an etch mask for 3D microfabrication. Here, we report the fabrication of various 3D microstructures using graphene etch masks directly grown and patterned on a Si substrate. The patterned graphene deforms and wraps the etched structures, allowing for the fabrication of complicated 3D microstructures, such as mushroom-like and step-like microstructures. As a practical demonstration of the graphene etch mask, we fabricate an omniphobic surface of reentrant 3D structures on a Si substrate. Our work provides a method for fabricating complex 3D microstructures using a graphene etch mask, contributing to advancements in etching and fabrication processes.
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