REDISTRIBUTION OF TEMPERATURE IN THE STRUCTURE IS UNDER THE INFLUENCE OF X-RAY
作者
Грошев,A. Groshev,Чубур,K. Chubur,Яньков,A. Yankov,Зольников,Vladimir Zolnikov,Савченко,А. А. Савченко
出处
期刊:Modeling of systems and processes日期:2016-05-11卷期号:8 (4): 7-10
标识
DOI:10.12737/19484
摘要
A mathematical model of redistribution of temperature in the IS, depending on housing construction, when exposed to X-rays. The result of the comparative analysis of heat redistribution in the typical structure of the silicon IS and bipolar transistor produced on a computer.