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Simulation of diamond synthesis by microwave plasma chemical vapor deposition with multiple substrates in a substrate holder

电场 钻石 多物理 材料科学 化学气相沉积 等离子体 离子源 基质(水族馆) 薄脆饼 微波食品加热 光电子学 光学 复合材料 有限元法 计算机科学 地质学 物理 海洋学 热力学 电信 量子力学
作者
Lin Li,Chengchun Zhao,Shulong Zhang,Qiaorui Gong,Xiaohui Sun,Min Qian,Yin Hang
出处
期刊:Journal of Crystal Growth [Elsevier BV]
卷期号:579: 126457-126457 被引量:9
标识
DOI:10.1016/j.jcrysgro.2021.126457
摘要

To simulate the electric field distribution in a cylindrical resonant cavity during diamond crystal growth by microwave plasma chemical vapor deposition (MPCVD), a three-dimensional (3D) model, based on the electromagnetic field part of the finite element simulation solver COMSOL Multiphysics software, was established in this study. It was found that precise fillet treatment for the edge of the sample holder in the cavity can effectively improve the distribution of the electric field in this area, which is more conducive for the epitaxial growth of diamond. Based on the actual experimental requirements, nine diamond substrates were added to the holder with a previously processed edge fillet. By comparing with the simulated situation without substrates, it was proved that the addition of substrates influences the electric field distribution nearby. Furthermore, a new groove substrate holder with rounded corners was designed. Nine substrates with specific spacing were added to the groove holder, and the 3D and two-dimensional electric field distribution in this region were obtained. The optimized substrate holder makes the substrates less exposed to strong microwave plasma, which aids in high-quality single-crystal diamond synthesis. The simulation results were further verified experimentally.
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