折射率
材料科学
光学
色散(光学)
波长
镜头(地质)
光刻
激光器
光电子学
物理
作者
John H. Burnett,Rajeev Gupta,Ulf Griesmann
出处
期刊:Applied optics-OT
[The Optical Society]
日期:2002-05-01
卷期号:41 (13): 2508-2508
被引量:37
摘要
We present high-accuracy measurements for wavelengths near 157 nm of the absolute index of refraction, the index dispersion, and the temperature dependence of the index for the ultraviolet optical materials with cubic symmetry: CaF2, SrF2, BaF2, and LiF. Accurate values of these quantities for these materials are needed for designs of the lens systems for F2 excimer-laser-based exposure tools for 157-nm photolithography. These tools are expected to use CaF2 as the primary optical material and possibly one of the others to correct for chromatic aberrations. These optical properties were measured by the minimum deviation method. Absolute refractive indices were obtained with an absolute accuracy of 5 x 10(-6) to 6 x 10(-6).
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