Chemically Amplified Electron-Beam Photoresists

Two novel series of electron-beam photoresists possessing high sensitivity and contrast have been developed based on chemical amplification chemistry. The amplification process relies on the electron-beam-induced generation of acids derived from the decomposition of onium salts to catalytically deblock pendant tert-butyl ester groups along the backbone of a photoresist polymer or alternatively similar groups present in dissolution inhibitors.