化学气相沉积
材料科学
氯
沉积(地质)
热膨胀
大气温度范围
微观结构
碳纤维
分析化学(期刊)
热力学
复合数
化学
复合材料
冶金
纳米技术
环境化学
物理
古生物学
生物
沉积物
摘要
Process conditions are described for the chemical vapor deposition of ZrC from ZrCl/sub 4/--CH/sub 4/--HCl--H/sub 2/--Ar vapor over the temperature range 1320 to 1775 deg K. From an analysis of the process conditions (initial composition of coating gas, axial temperature profile along the tubes, total pressure, and length of deposition time), the subsequent ZrC coat thickness profiles and thermodynamic data, an equation expressing the variation of the axial rate of ZrC deposition is derived. This expression can be used for the estimation of process conditions required to yield a specified ZrC coat profile. Variations of the chlorine and oxygen contents, lattice pararmeter, microstructure of the ZrC deposit and thermal expansion coefficient as a function of deposition temperature are described. (11 figures, 3 tables) (auth)
科研通智能强力驱动
Strongly Powered by AbleSci AI