纳米尺度
材料科学
热流
光子学
光电子学
晶体管
热的
电子设备和系统的热管理
光开关
纳米技术
物理
电压
量子力学
工程类
机械工程
气象学
作者
Ju Won Lim,Ayan Majumder,Rohith Mittapally,Audrey Rose Gutierrez,Yuxuan Luan,Edgar Meyhöfer,Pramod Reddy
标识
DOI:10.1038/s41467-024-49936-0
摘要
Abstract Control of heat flow is critical for thermal logic devices and thermal management and has been explored theoretically. However, experimental progress on active control of heat flow has been limited. Here, we describe a nanoscale radiative thermal transistor that comprises of a hot source and a cold drain (both are ~250 nm-thick silicon nitride membranes), which are analogous to the source and drain electrodes of a transistor. The source and drain are in close proximity to a vanadium oxide (VO x )-based planar gate electrode, whose dielectric properties can be adjusted by changing its temperature. We demonstrate that when the gate is located close ( < ~1 µm) to the source-drain device and undergoes a metal-insulator transition, the radiative heat transfer between the source and drain can be changed by a factor of three. More importantly, our nanomembrane-based thermal transistor features fast switching times ( ~ 500 ms as opposed to minutes for past three-terminal thermal transistors) due to its small thermal mass. Our experiments are supported by detailed calculations that highlight the mechanism of thermal modulation. We anticipate that the advances reported here will open new opportunities for designing thermal circuits or thermal logic devices for advanced thermal management.
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