等效串联电阻
萃取(化学)
MOSFET
材料科学
系列(地层学)
电压
CMOS芯片
栅极电压
阈值电压
光电子学
排水诱导屏障降低
电气工程
分析化学(期刊)
凝聚态物理
化学
物理
晶体管
工程类
色谱法
地质学
古生物学
作者
Kiyoshi Takeuchi,T. Mizutani,Takuya Saraya,Hiroshi Oka,Takahiro Mori,Masaharu Kobayashi,Toshiro Hiramoto
标识
DOI:10.35848/1347-4065/acac3c
摘要
Abstract A series resistance extraction method proposed recently, which uses multiple drain current versus gate voltage curves at varied drain voltages, was applied to bulk CMOS devices at low temperatures down to 4 K. A moderate reduction of series resistance compared with 300 K was found. Horizontal field dependence of mobility significantly changed with temperature, which was taken into account during the extraction. Anomalous non-linear series resistance was observed at 4 K only for p-channel FETs, suggesting the need for careful source/drain overlap design for low temperature operations.
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