材料科学
电镀
温度循环
引线键合
焊接
冶金
陶瓷
动力循环
复合材料
电镀(地质)
铜
模具(集成电路)
直接结合
抗剪强度(土壤)
图层(电子)
可靠性(半导体)
功率(物理)
硅
电气工程
热的
土壤科学
纳米技术
炸薯条
土壤水分
地球物理学
气象学
工程类
地质学
物理
量子力学
环境科学
作者
Felix Häuβler,Marcel Sippel,Mario Sprenger,Lu Liu,Martin Muckelbauer,Jörg Franke
出处
期刊:
日期:2022-09-13
卷期号:: 456-461
被引量:2
标识
DOI:10.1109/estc55720.2022.9939424
摘要
Silver direct bonding as die-attach method is a new approach to form metallurgical bonds between dies and copper-ceramic substrates. Silver as a mono-metallic joining partner is a prerequisite and joined by applying pressure and heat for a given time. The aim of this work is to compare electroless and electroplated silver metallization of copper ceramic substrates applicability for direct bonding. This is achieved by comparing shear strength and durability in active power cycling of the formed joints. For the active power cycling the direct bonded samples are compared to sintered interconnects in the same setup. Results show, that the electroplated metallization performs mechanically slightly more stable than the electroless ones but is significantly influenced by surface roughness. The active power cycling results yield the highest reliability for silver sintered bonds in the raw data after power cycling and for the electroplated joints if a junction temperature correction is applied. The reliable electroplated samples reached the failure criteria at a comparable average number of power cycles as the sintered reference samples. Both groups exhibit bond wire lift-off on the topside interconnect as failure cause. Electroless plating reached less than 10,000 cycles in average compared to ~35,000 cycles for sintered and ~27,000 cycles for electroplated diodes.
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