Fabrication of a 100 × 100 mm2 nanometer-thick graphite pellicle for extreme ultraviolet lithography by a peel-off and camphor-supported transfer approach

We fabricated a non-destructive and residue-free freestanding nanometer-thick graphite (NGF) pellicle (thickness ∼ 20 nm) with a size of 100 × 100 mm 2 by developing a method using a peel-off approach combined with camphor-supported transfer.