材料科学
兴奋剂
带隙
量子隧道
碳纳米管
光电子学
晶体管
碳纳米管场效应晶体管
场效应晶体管
泄漏(经济)
纳米技术
电压
电气工程
工程类
经济
宏观经济学
作者
Qing Lin,Carlo Gilardi,Sheng-Kai Su,Zichen Zhang,Edward Chen,Prabhakar R. Bandaru,Andrew C. Kummel,Iuliana Radu,Subhasish Mitra,Gregory Pitner,H.-S. Philip Wong
出处
期刊:ACS Nano
[American Chemical Society]
日期:2023-11-01
卷期号:17 (21): 21083-21092
标识
DOI:10.1021/acsnano.3c04346
摘要
Carbon nanotube (CNT) transistors demonstrate high mobility but also experience off-state leakage due to the small effective mass and band gap. The lower limit of off-current (IMIN) was measured in electrostatically doped CNT metal-oxide-semiconductor field-effect transistors (MOSFETs) across a range of band gaps (0.37 to 1.19 eV), supply voltages (0.5 to 0.7 V), and extension doping levels (0.2 to 0.8 carriers/nm). A nonequilibrium Green's function (NEGF) model confirms the dependence of IMIN on CNT band gap, supply voltage, and extension doping level. A leakage current design space across CNT band gap, supply voltage, and extension doping is projected based on the validated NEGF model for long-channel CNT MOSFETs to identify the appropriate device design choices. The optimal extension doping and CNT band gap design choice for a target off-current density are identified by including on-current projection in the leakage current design space. An extension doping level >0.5 carrier/nm is required for optimized on-current.
科研通智能强力驱动
Strongly Powered by AbleSci AI