Research on negative photoresist ROL 7133 based on femtosecond laser two-photon polymerization technology

Femtosecond laser two-photon polymerization (TPP) micro-nanofabrication technology has the potential to transcend the limitations of classical optical theory, enabling the processing of intricate three-dimensional structures in arbitrary three-dimensional space. The processing parameters of the negative photoresist ROL 7133 are investigated through the use of TPP micromachining technology. In depth exploration is conducted into the geometrical parameters of the photoresist at varying powers and speeds. Cuboids are prepared through the utilization of the parameters that have been deemed suitable. The experimental results demonstrated that the lines could be processed with precise shape accuracy under a single scan with a laser power of 20 mW and a scanning speed of 30 μm/s. Furthermore, cuboids with excellent topographic quality could be prepared with this processing parameter, which aligns with the intended design with minimal relative error. The findings of this study provide a foundation for further theoretical and experimental investigation of ROL 7133 as a two-photon polymerization micro-nanofabrication material.