包层(金属加工)
折射率
材料科学
干涉测量
光学
包层模式
多模光纤
电子束光刻
天文干涉仪
平版印刷术
光刻
光电子学
光纤
光纤传感器
纳米技术
抵抗
物理
保偏光纤
冶金
图层(电子)
作者
Keito Ebihara,Kiyoshi Asakawa,Hiroaki Suzuki
出处
期刊:Optical Engineering
[SPIE - International Society for Optical Engineering]
日期:2021-02-10
卷期号:60 (02)
被引量:16
标识
DOI:10.1117/1.oe.60.2.027103
摘要
A selectively excited bimodal interferometer was developed for highly sensitive detection of refractive index changes. Numerical simulation revealed that multimode waveguides with tall, narrow cross-sections are suitable for realizing a highly sensitive bimodal (fundamental and lateral first-order modes) interferometer, owing to deeper penetration of the lateral first-order mode through its side surfaces into the cladding medium. A device with an optimum design was determined by simulation and fabricated by electron-beam lithography using a negative photoresist as the material for the waveguide core. The detection of glucose was demonstrated, and the sensitivity and detection limit was found to be 2547 rad / RIU (RIU—refractive index unit) and 9.8 × 10 − 6 RIU, respectively.
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