铁电性
纳米电子学
材料科学
铟
场效应晶体管
光电子学
凝聚态物理
极化(电化学)
晶体管
相变
半导体
电场
纳米技术
硒化物
相(物质)
电介质
原子单位
压电响应力显微镜
电阻和电导
纳米线
非易失性存储器
压力(语言学)
纳米尺度
Valleytronics公司
电导
电子全息术
作者
Ghosh, Jishnu,Parate, Shubham,Basak, Arup,De, Binoy Krishna,Mukhopadhyay, Krishnendu,Agarwal, Abhinav,Gupta, Gopesh Kumar,Nath, Digbijoy,Nukala, Pavan
标识
DOI:10.48550/arxiv.2509.09233
摘要
Indium selenide (In2Se3), a ferroelectric semiconductor, offers a unique platform for multifunctional nanoelectronics owing to the interplay between polarization dynamics, interlayer sliding, and structural polymorphism. Ferroelectric semiconductor field-effect transistors (FeS-FETs) provide an ideal architecture to harness this coupling. Here, we demonstrate gate-tunable negative differential resistance (NDR) with high peak-to-valley ratios and hysteretic output conductance in In2Se3 FeS-FETs. Combining high-resolution electron microscopy with electrical transport measurements, we attribute the NDR to a field-induced, volatile phase transition from a low-resistance alpha-2H phase to a high-resistance state. Atomic scale ex-situ imaging reveals that in-plane electric fields (Vd) drive interlayer sliding, rotational misalignments that generate Moire patterns, and intralayer shear-together producing stress induced phase transitions. Out-of-plane field however results in robust non-volatile polarization switching. These mechanistic insights highlight both the promise of two dimensional ferroelectric devices for multifunctional nanoelectronics and alternative computing paradigms, and the intrinsic limitations of In2Se3 field-effect transistors for conventional ferroelectric memory applications.
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