A hybrid resist hemispherical-pit array layer for light trapping in thin film silicon solar cells via UV nanoimprint lithography

Micromorph tandem solar cells coated with a HP array layer were fabricated by UV NIL. The HP array layer could reduce the average reflectance of the solar cells from 7.7% to 1.8%. And a relative improvement of efficiency of up to 4.1% is observed as compared to the bare solar cells.