Low-Frequency Noise in Vertical InAs/InGaAs Gate-All-Around MOSFETs at 15 K for Cryogenic Applications

Low-frequency noise (LFN), or 1/ ${f}$ -noise, can be used effectively to evaluate device reliability which is a major concern in analog as well as digital circuits. In this work, we present 1/ ${f}$ -noise characterization of vertical InAs/InGaAs gate-all-around (GAA) MOSFETs with a 70-nm gate length ( ${L}_{G}$ ) measured at cryogenic temperatures down to 15 K. The measurements at cryogenic temperatures reveal that the physical mechanism of 1/ ${f}$ -noise changes from carrier number fluctuations at 300 K to mobility fluctuations at 15 K. We conclude that the channel conduction at 15 K is dominated by the nanowire core instead of the nanowire surface due to the effect of the border and interface traps freezing out. Vertical InAs/InGaAs GAA MOSFETs at 15 K, due to reduced surface scattering, exhibit a low value of Hooge parameter, $\alpha _{\text {H}} $ ~ $5\times 10^{\text {-{6}}}$ and also have a low input-referred gate voltage noise spectral density, ${S}_{\text {VG}} = 4.3\,\,\mu \text{V}^{{2}}\,\,\mu \text{m}^{{2}}$ Hz $^{\text {-1}}$ that are important for reliable cryogenic circuit applications.