材料科学
烧蚀
碳化硅
通量
准分子激光器
陶瓷
蒸发
光热治疗
激光烧蚀
硅
光学
准分子
激光器
烧蚀区
分析化学(期刊)
复合材料
光电子学
纳米技术
航空航天工程
化学
工程类
物理
热力学
色谱法
作者
Xin Guo Xin Guo,Jinbin Ding Jinbin Ding,Yi Zhou Yi Zhou,Yu Wang
标识
DOI:10.3788/col201816.091402
摘要
The ablation of sintered silicon carbide ceramics by an ArF excimer laser was studied. Three zones are generated: the ablation zone that presented molten morphology and was composed by the Si and C phase; the condensation zone formed by vaporized SiC; and the oxidation zone that showed the characteristics of thermal oxidation. The ablation depth and oxidation range increase linearly with fluence and pulses within 0.5–4 J/cm2, but the normalized ablation efficiency is constant (3.60 ± 0.60 μm·mm2/J). The theoretical photochemical ablation depth supplies 25% of the total depth at 1 J/cm2 but decreases to 16% at 4 J/cm2. The ablation is dominated by the photothermal effect and conforms to the thermal evaporation mechanism.
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