电阻率和电导率
材料科学
共发射极
金属化
金属
Crystal(编程语言)
兴奋剂
丝网印刷
硅
氧化物
冶金
复合材料
光电子学
电气工程
计算机科学
程序设计语言
工程类
作者
Guoguang Xing,Wei Chen,Yaoping Liu,Xiaolong Du
标识
DOI:10.1016/j.solmat.2024.112814
摘要
It has been reported that adding Al to Ag metallization paste can reduce the contact resistivity on boron-doped emitters of n-type c-Si solar cells such as Tunnel Oxide Passivated Contact solar cell(TOPCon), because Al can assist forming Ag–Al spikes and dope into the p + emitter. However, Al addition also increases surface recombination and grid line resistivity. Therefore, a comprehensive understanding to the effect of Al on reducing contact resistivity is crucial for optimization of metallization process. In this paper, we investigated the contact characteristics between Ag–Al pastes with p-Si in comparison with those between Ag paste with p-Si. It was revealed that the driving forces for forming electrical contacts between Ag–Al pastes with p-Si is different from those between Ag pastes with p-Si. Moreover, we found that Al will induce the variation of Ag crystal orientation from (111) plane to (200) plane during firing. This induction process is firmly related to the melting amount of Ag during firing, accompanied by the disappearance of Ag3Al. Finally, the effect of Al addition on the contact potential reduction of metal electrodes/p-Si was studied so as to figure out the solution to improving contact properties, which is of great significance for the development of advanced Ag–Al pastes.
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