石墨烯
成核
材料科学
化学气相沉积
铜
表面扩散
纳米技术
扩散
化学工程
晶体生长
单晶
石墨烯纳米带
化学物理
氧气
化学
结晶学
物理化学
冶金
热力学
吸附
有机化学
工程类
物理
作者
Yufeng Hao,M. S. Bharathi,Lei Wang,Yuanyue Liu,Hua Chen,Shu Nie,Xiaohan Wang,Harry Chou,Cheng Tan,Babak Fallahazad,H. Ramanarayan,Carl W. Magnuson,Emanuel Tutuc,Boris I. Yakobson,Kevin F. McCarty,Yong‐Wei Zhang,Philip Kim,James Hone,Luigi Colombo,Rodney S. Ruoff
出处
期刊:Science
[American Association for the Advancement of Science]
日期:2013-10-25
卷期号:342 (6159): 720-723
被引量:1119
标识
DOI:10.1126/science.1243879
摘要
The growth of high-quality single crystals of graphene by chemical vapor deposition on copper (Cu) has not always achieved control over domain size and morphology, and the results vary from lab to lab under presumably similar growth conditions. We discovered that oxygen (O) on the Cu surface substantially decreased the graphene nucleation density by passivating Cu surface active sites. Control of surface O enabled repeatable growth of centimeter-scale single-crystal graphene domains. Oxygen also accelerated graphene domain growth and shifted the growth kinetics from edge-attachment-limited to diffusion-limited. Correspondingly, the compact graphene domain shapes became dendritic. The electrical quality of the graphene films was equivalent to that of mechanically exfoliated graphene, in spite of being grown in the presence of O.
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