Resrarch Status of Ultraviolet Photoresist

The optical lithography using the 193nm excimer laser is a key technique for decreasing feature size of very large scale integration (VLSI) in the 21st century and has become one of the challenge topics in the high-tech.research areas.So,the article introduces several important UV photoresists and their development in recent years.The different components of the ArF Excimer laser photoresist were sμmmarized in detail.Meantime,it points out the structure and component of photopolymer are improved which can obtain good performance of the resist.It's good for our analysis and research.