溅射
离子
分子动力学
材料科学
碳纤维
产量(工程)
化学物理
原子物理学
无定形碳
分子物理学
无定形固体
化学
纳米技术
结晶学
薄膜
计算化学
复合材料
物理
复合数
有机化学
作者
Huy Tran,Huck Beng Chew
出处
期刊:Carbon
[Elsevier BV]
日期:2023-01-10
卷期号:205: 180-193
被引量:19
标识
DOI:10.1016/j.carbon.2023.01.015
摘要
Experiments report large scatter in the sputtering yield of carbon materials under the bombardment of low-energy noble gas ions. Here, we conduct scale-bridging molecular dynamics (MD) simulations on the xenon bombardment of carbon substrates across ion energies of 75 eV to 2 keV, and at ion incidence angles of 0°–75°, to resolve uncertainties in the sputtering data. Results show rapid amorphization of the carbon subsurface with ion bombardment, but the structural characteristics (sp/sp2/sp3 bond proportion, atomic density) eventually plateau once steady-state sputtering is achieved. In addition, we obtain virtually indistinguishable “steady-state” amorphous structures across the range of ion energies and ion incidence angles, as well as for several different carbon structures, which suggests that the steady-state sputtering yield data is independent of the initial carbon structure and prior sputtering history. By accounting for changes in the local incidence angle, surface shielding, and redeposition of the sputterants associated with surface morphology effects, we demonstrate that the sputtering predictions from MD are in perfect agreement with prior experiments across the range of ion energies and incidence angles. Using a Bayesian approach based on the MD data, we calibrate the parameters of a semi-empirical sputtering model for different surface morphologies.
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