Large enhancement of ferroelectric polarization in Hf0.5Zr0.5O2 films by low plasma energy pulsed laser deposition

PLD of ferroelectric HfO 2 done under a mixed Ar and O 2 atmosphere allows the reduction of the PLD plasma energy, resulting in fewer defects and an increase of the ferroelectric polarization of around 50% compared to films grown by conventional PLD.