Electro-optical properties of spray deposited fluorine doped tin oxide thin films for solar cell applications

Pure and Fluorine doped 1.8 µm thicknesses tin oxide thin film has been prepared from SnCl2 precursor by Spray pyrolysis technique. The structural, optical and electrical studies were carried out for the prepared thin film by XRD, UV-Vis NIR and Four Probe methods. The sheet resistance of the thin film was found to a minimum of 1.0 Ω for 15 wt. % of NH4F but increased thereafter. In the Present Study The minimum sheet resistance observed is the lowest among the reported values for SnO2:F films. The Optical transmittance was found to74 % at 750 nm which is increases with the increase in fluorine concentration.