氮化硼
材料科学
紧密结合
单层
双层
堆积
结合能
基态
硼
氮化物
化学物理
分子物理学
凝聚态物理
结晶学
电子结构
计算化学
膜
纳米技术
图层(电子)
原子物理学
化学
物理
有机化学
生物化学
作者
R. M. Ribeiro,N. M. R. Peres
出处
期刊:Physical Review B
[American Physical Society]
日期:2011-06-09
卷期号:83 (23)
被引量:185
标识
DOI:10.1103/physrevb.83.235312
摘要
We have studied boron nitride monolayer and bilayer band structures. For\nbilayers, the ground state energies of the different five stackings are\ncomputed using DFT in order to determine the most stable configuration. Also,\nthe interlayer distance for the five different types of stacking in which\nboron-nitride bilayers can be found is determined. Using a minimal tight\nbinding model for the band structures of boron nitride bilayers, the hopping\nparameters and the onsite energies have been extracted by fitting a tight\nbinding empirical model to the DFT results.\n
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