A regular square mesh structure with 4.5 nm periodicity was formed after annealing an adsorption layer of Ti on W(100) at 1370 K. The nanomesh consists of two self-assembled layers on top of the Ti adlayer, ~3.5 physical monolayers thick on average. The first layer of the nanomesh is composed of wires ~1.3 nm wide arranged along the directions of the W(100) substrate. The second one is formed by islands of ~1.6 nm in diameter arrayed upon crossing sites of the wires. The nanomesh is thermally stable up to 1470 K.