The law of wet oxidation rate in 850nm VCSELs

Wet-oxidation experiments in a nitrogen environment at high temperatures are conducted to improve the photoelectricity performance of the 850nm VCSELs. It is very important to accurately control the oxidation aperture.We have carried out upon the wafer of VCSELs with the same structure by changing the furnace temperature and oxidation time, then micro-probe analyses have been examined at different oxidation depth by scanning electron microscope (SEM) and by X-ray. Oxidation products are examined at different oxidation depths of oxidation layer and each component content is analyzed, we get the law of the wet-oxidation. The oxidation process thermal stability and precision can be improved by lowering the oxidation temperature and prolonging the oxidation time.