Molybdenum Thin Film Formation from Molybdenum Nitride Deposited by Plasma-enhanced Atomic Layer Deposition with Hydrogen-permeable Mechanical Capping Layer

In this study, we developed a Mo metal thin film deposition process consisting of two steps: Mo2N thin film deposition using plasma-enhanced atomic layer deposition, followed by rapid thermal annealing. The mechanism underlying the reduction of Mo2N during the post-deposition annealing was investigated. Agglomeration during the reduction of Mo2N to Mo was successfully suppressed by using a hydrogen-permeable mechanical capping layer. Finally, a Mo thin film formation process with low resistance, even at a thickness of 5 nm, was achieved.