材料科学
光电子学
散裂
碳化硅
瞬态(计算机编程)
MOSFET
晶体管
偏压
温度测量
热的
散裂中子源
电压
场效应晶体管
负偏压温度不稳定性
辐照
电场
阈值电压
栅氧化层
宽禁带半导体
电流(流体)
深能级瞬态光谱
凝聚态物理
砷化镓
辐射
排水诱导屏障降低
撞击电离
金属浇口
雪崩击穿
辐射硬化
频道(广播)
电离
硅
缩放比例
电子工程
作者
WenLu Zhu,Chao Peng,Hongxia Guo,Wuying Ma,Xiangli Zhong,Xuefei Liu,Yanhui Cao,Zhifeng Lei
标识
DOI:10.1109/tns.2026.3657337
摘要
This study systematically investigates the effects of temperature and negative gate bias on the atmospheric neutron-induced single-event burnout (SEB) effect in SiC double-trench metal-oxide-semiconductor field-effect transistors (SiC DTMOSFETs). This research combines accelerated irradiation experiments at the China Spallation Neutron Source (CSNS) with technology computer aided design (TCAD) simulations. Experimental results indicate that the SEB failure rate decreases exponentially with increasing temperature, dropping from 14.4 FIT at -35°C to 1.15 FIT at 105°C. The influence of negative gate bias is relatively weak, with the failure rate decreasing only from 9.37 FIT to 7.06 FIT as Vgs varies from -15V to 0V. TCAD simulations reveal the underlying physical mechanism, whereby temperature reduction intensifies impact ionisation and increases transient current peaks, triggering thermal runaway. Consequently, temperature significantly impacts SEB. The dual-trench structure is the cause of the gate voltage's primary effect on the surface channel potential, with minimal influence on the bulk region electric field distribution that determines SEB sensitivity. This results in a smaller influence of negative gate voltage on SEB effect.
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