神经形态工程学
MNIST数据库
材料科学
晶体管
光电子学
原子层沉积
计算机科学
纳米技术
突触
电子工程
人工神经网络
电气工程
图层(电子)
电压
神经科学
工程类
人工智能
生物
作者
Junhyeong Park,Yumin Yun,Sung‐Soo Bae,Yuseong Jang,Seungyoon Shin,Soo‐Yeon Lee
出处
期刊:Advanced Science
[Wiley]
日期:2025-03-20
卷期号:12 (21): e2500568-e2500568
被引量:15
标识
DOI:10.1002/advs.202500568
摘要
Neuromorphic computing emulating the human brain offers a promising alternative to the Von Neumann architecture. Developing artificial synapses is essential for implementing hardware neuromorphic systems. Indium-gallium-zinc oxide (IGZO)-based synaptic transistors using charge trapping have advantages, such as low-temperature process and complementary metal-oxide-semiconductor compatibility. However, these devices face challenges of low charge de-trapping efficiency and insufficient retention. Here, IGZO synaptic transistors are introduced utilizing an indium-tin oxide (ITO) floating gate (FG) to overcome these limitations. The ITO FG's higher conductivity and alleviated chemical interactions with the Al2O3 tunneling layer (TL) deposited by atomic layer deposition result in enhanced electrical performance with a smooth FG/TL interface. An 8 × 8 synapse array achieves 100% yield and successful programming without interference using a half-pulse scheme. Spiking neural network simulations on MNIST and Fashion-MNIST datasets demonstrate high accuracies of 98.31% and 87.76%, respectively, despite considering device variations and retention. These findings highlight the potential of IGZO synaptic transistors for neuromorphic computing applications.
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