介电常数
三联结
材料科学
电场
光电子学
半导体
分级(工程)
压力(语言学)
电气工程
电子工程
工程物理
计算机科学
工程类
电介质
物理
量子力学
哲学
土木工程
语言学
作者
Muneaki Kurimoto,Shesha Jayaram
标识
DOI:10.1109/eic63069.2025.11123217
摘要
One of the major concerns in high-voltage power semiconductor modules is the high electric field stress at the edge of the metallization, where the substrate, encapsulation material, and electrode meet; commonly referred to as the triple junction. If this stress is not controlled, partial discharge may occur, eventually leading to insulation failure. To mitigate this issue, electric field grading techniques, such as the use of permittivity-graded materials in encapsulation, have been investigated. However, the optimal distribution of permittivity remains unclear. This study explores the effective distribution of relative permittivity ($\varepsilon_{\mathrm{r}}$) in permittivity-graded materials for reducing electric field stress at the triple junction. By comparing the stress-reducing effects of four different types of permittivity distributions, the study aims to identify and discuss the most effective approach.
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