薄膜晶体管
材料科学
兴奋剂
铟
锑
光电子学
无定形固体
晶体管
氧化物薄膜晶体管
薄膜
阈值电压
低压
分析化学(期刊)
纳米技术
电气工程
电压
冶金
化学
结晶学
图层(电子)
工程类
色谱法
作者
Hyo Jin Kim,So Yeon Je,Ju Yeon Won,Jong Han Baek,Jae Kyeong Jeong
标识
DOI:10.1002/pssr.201409402
摘要
The effects of antimony (Sb) doping on solution-processed indium oxide (InOx) thin film transistors (TFTs) were examined. The Sb-doped InSbO TFT exhibited a high mobility, low gate swing, threshold voltage, and high ION/OFF ratio of 4.6 cm2/V s, 0.29 V/decade, 1.9 V, and 3 × 107, respectively. The gate bias and photobias stability of the InSbO TFTs were also improved by Sb doping compared to those of InOx TFTs. This improvement was attributed to the reduction of oxygen-related defects and/or the existence of the lone-pair s-electron of Sb3+ in amorphous InSbO films. (© 2014 WILEY-VCH Verlag GmbH &Co. KGaA, Weinheim)
科研通智能强力驱动
Strongly Powered by AbleSci AI