抗菌剂
聚合物
材料科学
图层(电子)
堆栈(抽象数据类型)
纳米技术
傅里叶变换红外光谱
荧光
化学工程
化学
有机化学
复合材料
计算机科学
光学
物理
工程类
程序设计语言
作者
Franziska Dorner,David Boschert,Alexandra Schneider,Wibke Hartleb,Ali Al‐Ahmad,Karen Lienkamp
出处
期刊:ACS Macro Letters
[American Chemical Society]
日期:2015-11-17
卷期号:4 (12): 1337-1340
被引量:29
标识
DOI:10.1021/acsmacrolett.5b00686
摘要
Regeneration of functional polymer surfaces after damage or contamination is an unresolved scientific challenge, and also of practical importance. In this proof-of-concept study, we present a method to regenerate a functional surface property using a polymer multi-layer architecture. This is exemplified using antimicrobially active surfaces. The idea is to shed the top layer of the polymer layer stack, like a reptile shedding its skin. The proof-of-concept stack consists of two antimicrobial layers and a degradable interlayer. Shedding of the top layer is enabled by degrading that interlayer. The shedding process was analyzed by quantitative fluorescence microscopy, ellipsometry, and FTIR spectroscopy. Antimicrobial assays revealed that the functionality of the emerging antimicrobial layer was fully retained after shedding.
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