Tantalum Pentoxide Optical Coatings for High-Power Photonics: A Review of Deposition, Defect Control, Nonlinear Response, and Laser Damage Reliability

超连续谱 五氧化二钽 材料科学 激光器 涂层 光学涂层 光电子学 电介质 光子学 可靠性(半导体) 光学 波长 折射率 非线性光学 非线性系统 防反射涂料 光通信 工程物理 电子工程 非线性光学 计算机科学 机身
作者
Changtong Li,Hsin-Han Peng,Chih-Yu Wang,Hsiang‐Chen Chui,C W Lee,Xiaoming Chen
出处
期刊:Coatings [Multidisciplinary Digital Publishing Institute]
卷期号:16 (5): 596-596 被引量:1
标识
DOI:10.3390/coatings16050596
摘要

Tantalum pentoxide (Ta2O5) has emerged as a versatile material at the intersection of optical coatings and integrated photonics because it combines a high refractive index, a wide bandgap, low optical loss, and compatibility with multiple thin-film deposition routes. Over the past decade, the literature has expanded from conventional dielectric coating studies to low-loss waveguides, micro-ring resonators, wavelength conversion, and broadband supercontinuum generation, while more recent work has increasingly emphasized defect engineering, nonlinear absorption, and laser damage reliability under strong optical fields. The objective of this review is to establish a process–structure–composition–property–function–reliability framework for understanding Ta2O5 and non-stoichiometric Ta2O5−x optical coatings in high-power photonics. Unlike previous reviews that mainly emphasized dielectric properties, deposition methods, or general thin-film applications, this review highlights how deposition-induced composition changes, oxygen vacancy-related defects, nonlinear optical response, and laser damage reliability jointly determine the operational limits of tantalum oxide photonic materials. Particular attention is given to ion-assisted and ion gun-assisted processes, which have repeatedly been associated with higher film density, smoother morphology, reduced oxygen vacancy-related loss, and more stable high-field behavior. By linking coating-level process control to device-level functions such as four-wave mixing, self-phase modulation, wavelength conversion, and supercontinuum generation, this review highlights how thin-film engineering governs both optical performance and operational limits. It also identifies several persistent gaps, including the need for standardized reporting of nonlinear absorption, unified damage metrics across film and device geometries, and stronger correlations among microstructure, composition, defects, and long-term optical stability. Overall, this review provides a composition-aware and coating-informed framework for interpreting Ta2O5 photonics and a practical roadmap for developing durable high-power photonic components.
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