材料科学
化学气相沉积
氮化物
氮化硅
硅
沉积(地质)
氨
等离子体增强化学气相沉积
化学工程
氮气
薄膜
作者
R. C. Taylor,B. A. Scot
出处
期刊:MRS Proceedings
[Springer Nature]
日期:1987-01-01
卷期号:105 (1): 319-324
被引量:5
摘要
Hexachlorodisilane (Si2Cl6) has been used as an alternative to dichlorosilane and silane for growth of silicon nitride films. The films were grown at a pressure of 0.7 Torr at temperatures between 450° and 850°C. Growth rate data indicates a kinetically controlled deposition with an activation energy of 29.3 kcal/mole. Growth rates are substantially higher than those obtained from SiH2Cl2 under similar conditions, and the physical properties of the films are essentially the same. At the higher growth temperatures stoichiometric Si3N4 films with no detectable chlorine can be obtained when a NH3/Si2Cl6 ratio of 60 or greater is used.
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