Lv7
4910 积分 2022-08-12 加入
Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
1个月前
已完结
Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching
1个月前
已完结
Loading effects in deep silicon etching
1个月前
已完结
Suppression of Microloading Effect by Low-Temperature SiO2 Etching
1个月前
已完结
Effect of Gas Species on the Depth Reduction in Silicon Deep-Submicron Trench Reactive Ion Etching
1个月前
已完结
Optimization of Shallow Trench Isolation CD micro loading in advance CMOS
1个月前
已完结
Suppression of Microloading Effect by Low-Temperature SiO2 Etching
1个月前
已完结
Microloading effect in reactive ion etching
1个月前
已完结
Dry Etching Characteristics of 16-nm Amorphous Carbon Layer in a Dual-Frequency Plasma Etcher
1个月前
已完结
C4F6 Etching Characteristics for High‐Aspect‐Ratio Etching of SiO2 Films Using an Inductively Coupled Plasma Etching System With Low‐Frequency Bias Power
1个月前
已完结
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