Structure and tribological properties of MoSe2 films prepared by two-step process

In order to extend the application range of solid lubricant MoSe2, a two-step process was adopted to prepare the MoSe2 film. Namely, the MoSex precursor layer was firstly deposited on the substrate by magnetron sputtering method, and then selenized in a Se vapor atmosphere to obtain MoSe2 film. The effects of the sputtering and selenization process on the structure and tribological properties of the films were investigated. The results show that the two-step prepared MoSe2 films exhibit a preferential orientation with (002) basal plane parallel to the substrate and an improved crystallinity. The prepared MoSe2 film has good wear resistance and lubricating performance in an ambient air environment, with the lowest average friction coefficient of 0.0443 and a specific wear rate of 1.03×10−5 mm3/(N·m). In addition, the lubrication effects of MoSe2 films through the adhesion mechanism and fill in-repair mechanism were further discussed.